September 1, 2003
Author(s)
E Jablonski, M Angelopoulos, H Ito, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, S Sambasivan, Daniel A. Fischer, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, K Temple
… model chemically amplified photoresists with various photo-acid generators. These materials are prone to interfacial and … If interfacial excess or depletion of the photo-generated acid occurs, either from atmospheric contamination, … NEXAFS, photo-acid generator, photoresist, surface chemistry …