Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Metal Patterning Using Tailored Functional Group Chemistry: Selective, Electroless Deposition of Metals on Self-Assembled Monolayers

Published

Author(s)

Christopher D. Zangmeister, Roger D. van Zee

Abstract

This study investigates the attachment of copper particles to self-assembled monolayers of mercaptobenzoic acids (MBA) on gold substrates. The carboxylate functional group of the MBAs coordinates with metal ions in solution and facilitates the electroless deposition of metals on top of the monolayer. Infrared spectroscopy was used to evaluate the formation of MBA monolayers on gold before and after the metal was deposition. atomic-force microscopy images show that 200 nm of copper is deposited on 4-MBA monolayers after 30 min of exposure to a copper plating solution. Copper deposits are not observed on 3-MBA monolayers, which suggests that the position of the carboxylic acid functionality on MBA may dictate the formation of copper deposits in this chemical system. On surfaces that were microcontact-printed with 4-MBA, copper deposited only on those areas where the monolayer was patterned. This study suggests that electroless deposition may be a viable strategy for attaching electrodes to molecules in nanoelectronic applications.
Citation
Langmuir
Volume
19
Issue
19

Keywords

electroless deposition, mercaptobenzoic acids, microcontact-printing, self-assembled monolayers

Citation

Zangmeister, C. and van, R. (2003), Metal Patterning Using Tailored Functional Group Chemistry: Selective, Electroless Deposition of Metals on Self-Assembled Monolayers, Langmuir (Accessed December 8, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created September 16, 2003, Updated February 19, 2017