March 1, 2007
Author(s)
B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with re