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Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions

Published

Author(s)

John S. Villarrubia, Nicholas W. Ritchie, J R. Lowney
Proceedings Title
Proceedings of SPIE, Volume 6518
Volume
6518
Conference Dates
February 26-March 1, 2007
Conference Location
San Jose, CA
Conference Title
Metrology, Inspection, and Process Control for Microlithography XXI

Citation

Villarrubia, J. , Ritchie, N. and Lowney, J. (2007), Monte Carlo Modeling of Secondary Electron Imaging in Three Dimensions, Proceedings of SPIE, Volume 6518, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913838 (Accessed April 15, 2024)
Created March 1, 2007, Updated February 19, 2017