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Manufacturing

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Displaying 1301 - 1325 of 2179

Engineering Informatics: Introduction to the Special Issue

March 1, 2008
Author(s)
Sudarsan Rachuri, Eswaran Subrahmanian
Computer-aided design, intelligent CAD, engineering analysis, collaborative design support, computer-aided engineering, and product lifecycle management are some of the terms that have emerged over the last 50 years of computing in engineering

The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology

February 6, 2008
Author(s)
Michael T. Postek, Andras Vladar
Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditional

Line Width Measurement Technique Using Through-Focus Optical Images

January 1, 2008
Author(s)
Ravikiran Attota, Richard M. Silver, Ronald G. Dixson
We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at different

Nano- and Atomic-Scale Length Metrology

December 14, 2007
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi G. Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu

Content-Based Assembly Search: A Step Towards Assembly Reuse

November 7, 2007
Author(s)
Ram D. Sriram, A S. Deshmukh, A G. Banerjee, Satyandra K. Gupta
The increased use of CAD systems by product development organizations has resulted in the creation of large databases of assemblies. This explosion of assembly data is likely to continue in the future. In many situations, text-based search alone may not be

The State of Container Security Standards

October 17, 2007
Author(s)
Shaw C. Feng, Simon P. Frechette
As cargo container security is a critical component in the U.S. homeland security, the communication among people in a chain of custody of a container needs to be timely and effective. Since people in the container custody chain often use different

Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST

October 1, 2007
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, James E. Potzick, Joseph Fu, Michael W. Cresswell, Richard A. Allen, S J. Smith, Anthony J. Walton
The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology. Two major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C

Instrumentation, Metrology, and Standards for Nanomanufacturing

September 10, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

Process Monitoring of Turning and Model Adaptation for Smart Machining Systems

September 3, 2007
Author(s)
Jarred C. Heigel, Robert W. Ivester
Smart Machining Systems improve manufacturing efficiency using optimization based on process models. Cutting force models developed from a narrow set of empirical data provide insight into the physical properties of cutting, but the extreme physical

An Integrated Simulation Environment for Incident Management Training

September 1, 2007
Author(s)
Charles R. McLean, Sanjay Jain, Yung-Tsun T. Lee, Guodong Shao
Simulation and gaming can support decision making through all phases of incident management including prevention, preparedness, response, recovery, and mitigation. A number of gaming and simulation tools have been developed for the purpose but they

Applying Serious Games to Intelligence Analysis

September 1, 2007
Author(s)
Don E. Libes, Theresa O'Connell
Knowledge from game design appears to offer new methods for software instruction and use that would traditionally require long, expensive, and not always effective training. In this paper, we explore the possibility of applying such knowledge to the field

Integration of Incident Management Simulation-based Training Applications

September 1, 2007
Author(s)
Charles R. McLean, Yung-Tsun T. Lee, Sanjay Jain
The nation's incident management personnel and emergency responders need to work in a coordinated, well-planned manner to best mitigate the impact of natural and man-made disasters. They need to be trained and be ready to act in view of increased security

Science based Information Metrology for Engineering Informatics

September 1, 2007
Author(s)
Sudarsan Rachuri
Engineering informatics is the discipline of creating, codifying (structure and behavior that is syntax and semantics), exchanging (interactions and sharing), processing (decision making), storing and retrieving (archive and access) the digital objects

Standardized Data Exchange of CAD Models with Design Intent

September 1, 2007
Author(s)
Junhwan Kim, Mike Pratt, Raj G. Iyer, Ram D. Sriram
Modern CAD systems generate feature-based product shape models with parameterization and constraints. Until recently, standards for CAD data exchange among different CAD systems were restricted to the exchange of pure shape information. These standards

Sustaining Engineering Informatics: Toward Methods and Metrics for Digital Curation

September 1, 2007
Author(s)
Joshua Lubell, Eswaran Subrahmanian, Mahesh Mani, Sudarsan Rachuri
Ensuring the long-term usability of engineering informatics (EI) artifacts is a challenge, particularly for products with longer life cycles than the computing hardware and software used for their design and manufacture. Addressing this challenge requires

The Helium Ion Microscope: A New Tool for Nanotechnology and Nanomanufacturing

September 1, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the
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