A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions will be presented. This technique has potential to identify which dimension is changing between two nanosized targets and to determine the dimension using a library-matching method. This methodology has utility for a wide range of target geometries and application areas, including nanomanufacturing, defect analysis, semiconductor process control, and biotechnology.
Citation: OTHER -
NIST Pub Series: Other
Pub Type: NIST Pubs
TSOM, optical microscope, nanometrology, nanomeasurement, particle analysis, semiconductor metrology