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Metrologic Support for the DARPA/NRL-XRL Mask Program: Ellipsometric Analyses of SiC Thin Films on Si

Published

Author(s)

Deane Chandler-Horowitz, Nhan Van Nguyen, Jay F. Marchiando, Paul M. Amirtharaj
Citation
NIST Interagency/Internal Report (NISTIR) -
Volume
4860

Citation

Chandler-Horowitz, D. , Nguyen, N. , Marchiando, J. and Amirtharaj, P. (1993), Metrologic Support for the DARPA/NRL-XRL Mask Program: Ellipsometric Analyses of SiC Thin Films on Si, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD (Accessed March 28, 2024)
Created December 31, 1992, Updated October 12, 2021