NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing
Published
Author(s)
Yong Zhou, Y J. Shen, Z M. Zhang, Benjamin K. Tsai, D P. DeWitt
Proceedings Title
8th Intl. Conf. on Advanced Thermal Processing of Semiconductors
Conference Location
Gaithersburg, MD, USA
Conference Title
Proc. 8th Intl. Conf. on Advanced Thermal Processing of Semiconductors
Pub Type
Conferences
Citation
Zhou, Y.
, Shen, Y.
, Zhang, Z.
, Tsai, B.
and DeWitt, D.
(2000),
Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing, 8th Intl. Conf. on Advanced Thermal Processing of Semiconductors , Gaithersburg, MD, USA
(Accessed October 8, 2025)