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Assessing Quantitative Optical Imaging for Realizing In-die Critical Dimension Metrology

Published

Author(s)

Bryan Barnes, Mark-Alexander Henn, Hui Zhou, Martin Sohn, Richard M. Silver

Abstract

Bryan M. Barnes, Mark-Alexander Henn, Hui Zhou, Martin Y. Sohn, and Richard M. Silver
Proceedings Title
2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
Conference Dates
March 21-23, 2017
Conference Location
Monterey, CA, US

Citation

Barnes, B. , Henn, M. , Zhou, H. , Sohn, M. and Silver, R. (2017), Assessing Quantitative Optical Imaging for Realizing In-die Critical Dimension Metrology, 2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, Monterey, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=923066 (Accessed December 12, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created March 19, 2017, Updated April 7, 2022