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A summary is given of the current work of Technical Committee (TC) 201 on Surface Chemical Analysis (SCA) of the International Organization for Standardization
Angela R. Hight Walker, Uwe Arp, Gerald T. Fraser, Thomas B. Lucatorto, J Wen
The success of the infrared program at the National Synchrotron Light Source [NSLS] has motivated the establishment of an infrared beamline at the infrared
R D. Suenram, Francis J. Lovas, C R. Quade, C F. Su
Fourier Transform Microwave (FTMW) Spectroscopy has been used to observe and resolve the 60 kHz tunneling splitting between the symmetric and antisymmetric
The material and manufacturing process selection problem is a multi-attribute decision making problem. These decisions are made during the preliminary design
Alline F. Myers, Eric B. Steel, M Q. Ding, S M. Camphausen, W B. Choi, J J. Cuomo, J J. Hren
The microstructure of highly sp 2 bonded amorphous carbon (a-C) and partially tetrahedrally bonded amorphous carbon (ta-C) films deposited on needle-shaped Mo
Stephen E. Russek, C. T. Rogers, L S. Kirschenbaum, P D. Beale, Steven C. Sanders
We report a correlation between peaks observed in the resistance versus applied magnetic field and low frequency resistance noise for Ni81Fe19/Ag giant
Charles T. Rogers, L S. Kirschenbaum, P D. Beale, Stephen E. Russek, S. Sanders
We report a correlation between peaks observed in the resistance versus applied magnetic field and low frequency resistance noise for Ni81Fe19/Ag giant
The technology of computer-aided design and computer aided manufacturing (CAD/CAM) has progressed significantly from the two-dimensional wireframe drafting
Charles T. Rogers, L S. Kirschenbaum, P D. Beale, Stephen E. Russek, S. Sanders
We report a correlation between peaks observed in the resistance versus applied magnetic field and low frequency resistance noise for Ni 81Fe 19/Ag giant
V W. Tsai, S. Wang, E. C. Williams, J Schneir, Ronald G. Dixson
The characteristics of the Si-vacuum interface were compared with the characteristics of the oxide-air interface formed following room temperature oxidation for