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Journals

Mass Absorption Coefficient of Tungsten, 1606-2100 eV

Author(s)
Zachary H. Levine, S Grantham, I McNulty
The transmission of soft x-rays with photon energies from 1606 eV to 2106 eV was measured for tungsten using thin film samples and a synchrotron source. This

Two-Species Magneto-Optical Trap With 40K and 87Rb

Author(s)
J Goldwin, S Papp, B. L. DeMarco, D S. Jin
We trap and cool a gas composed of 40K and 87 Rb, using a two-species magneto-optical trap (MOT). This trap represents the first step towards cooling the Bose

The Challenges of Nanometrology

Author(s)
Michael T. Postek
The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U

Toward Traceability for At Line AFM Dimensional Metrology

Author(s)
Ronald G. Dixson, Angela Guerry, Marylyn H. Bennett, Theodore V. Vorburger, Michael T. Postek
The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that

Large-Scale Metrology - An Update

Author(s)
William T. Estler, K L. Edmundson, G Peggs, D H. Parker
Developments in large-scale engineering metrology since the 1978 report of Puttock are reviewed. Advances in optical technology and fast, low-cost computation
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