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A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good...
Michael W. Cresswell, William B. Penzes, Robert Allen, L Linholm, C Ellenwood, E C. Teague
This test structure is based on the voltage-dividing potentiometer principle and was originally replicated in a single lithography cycle to evaluate feature...
Roger V. Bostelman, James S. Albus, Karl Murphy, T M. Tsai, E Amatucci
A lunar version of the Robocrane is being developed at the Robot Systems Division of the National Institute of Standards and Technology (NIST) to address the...
Requirements to reference spectra and criteria for mass spectrum inclusion, modification and deletion are developed as a result of evaluation of thousands of...
Models of detailed flame chemistry and soot formation are based upon experimental results obtained in steady, laminar flames. For successful application of...
Thomas G. Cleary, William L. Grosshandler, Jiann C. Yang
As part of the USAF, Army, Navy and FAA sponsored halon replacement project, the pipe flow characteristics of selected alternative agents for engine nacelle...
Howard H. Harary, C Buchard, P L heritier, J Dufraigne, P Chollet
The careful study of manufactured parts is a prerequisite for their intelligent inspection. For this study, we conducted a survey of the processes for making...
Jabez J. McClelland, R E. Scholten, R Gupta, Robert Celotta
We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been...
The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for...
During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high...
The resonant frequency of a sphere in contact with a flat surface was measured as a function of loading force for contacting materials with different elastic...
The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This...
Jun-Feng Song, F Rudder, Theodore V. Vorburger, A Hartman, Brian R. Scace, J Smith
Microform calibrations include the measurement of complex profile forms and position errors of micrometer scale in combination with the measurement of...
The National Institute of Standards and Technology has investigated the efficacy of indicating gaging systems used to measure pitch diameter and functional size...
An instrument is described which is shown capable of making preliminary measurements of nanonewton forces. A technique is described which allows absolute...