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John A. Dagata, O Glembocki, J Tuchman, K Ko, S Pang
Photoreflectance (PR) spectroscopy has been used to study the Fermi-level pinning position of chemically modified (100) GaAs surfaces. It is shown that there...
To facilitate the use of AFMs for manufacturing we have initiated a project to develop and calibrate artifacts which can in turn be used to calibrate a...
A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good...
Michael W. Cresswell, William B. Penzes, Robert Allen, L Linholm, C Ellenwood, E C. Teague
This test structure is based on the voltage-dividing potentiometer principle and was originally replicated in a single lithography cycle to evaluate feature...
Roger V. Bostelman, James S. Albus, Karl Murphy, T M. Tsai, E Amatucci
A lunar version of the Robocrane is being developed at the Robot Systems Division of the National Institute of Standards and Technology (NIST) to address the...
Requirements to reference spectra and criteria for mass spectrum inclusion, modification and deletion are developed as a result of evaluation of thousands of...
Models of detailed flame chemistry and soot formation are based upon experimental results obtained in steady, laminar flames. For successful application of...