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R Joseph Kline

Research Interests

My research involves developing methods for microstructural characterization of polymer thin films using x-ray diffraction and scanned probe microscopy. These measurements are used to determine the relationships between chemical structure, molecular packing, microstructure, electronic transport, and power conversion efficiency in semiconducting polymers for thin-film transistors and photovoltaics. I also am developing methods for using soft and hard x-ray scattering to characterize the pattern shape in next generation lithographies such as directed-self assembly of block copolymers. I am currently the project leader of the dimensional metrology project and actively participate in the organic electronics and photovoltaics project.


Awards and Honors

Professional Service

Research Opportunities

National Research Council Postdoctoral Fellowship – Open to U.S. citizens with an annual stipend of $65,600 per year. Applications are due on either Feb. 1 or Aug. 1. Contact me if interested in an NRC post-doc for researching organic electronics or photovoltaics, directed self-assembly of block copolymers, or X-ray scattering of polymers.

Selected Publications

  • "Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly," D.F. Sunday, M.R. Hammond, C. Wang, W.L. Wu, D.M. DeLongchamp, M. Tjio, J.Y. Cheng, J.W. Pitera, R.J. Kline, ACS Nano, 8 (8), 2014, 8426-8437 <Link>
  • "Molecular Origin of High Field-Effect Mobility in an Indacenodithiophene-Benzothiadiazole Copolymer," X. Zhang, H. Bronstein, A.J. Kronemeijer, J. Smith, Y. Kim, R.J. Kline, L.J. Richter, T.D. Anthopoulos, H. Sirringhaus, K. Song, M. Heeney, W. Zhang, I. McCulloch, D.M. DeLongchamp, Nature Comm. 4, 2013, 2238 <Link>
  • "Controlling the Microstructure of Solution-Processible Small Molecules in Thin-Film Transistors through Substrate Chemistry," R. J. Kline, S. D. Hudson, X. Zhang, D. Gundlach, A. Moad, L. J. Richter, O. Jurchescu, T. Jackson, S. Subramanian, J. E. Anthony, M. F. Toney, Chem. Mater. 23, (2011), 1194-1203 <Link>
  • "Contact-induced crystallinity for high-performance soluble acene-based transistors and circuits," D. J. Gundlach, J. E. Royer, S. K. Park, S. Subramanian, O. D. Jurchescu, B. H. Hamadani, A. J. Moad, R. J. Kline, L. C. Teague, O. Kirillov, C. A. Richter, J. G. Kushmerick, L. J. Richter, S. R. Parkin, T. N. Jackson, and J. E. Anthony, Nature Materials 7 (3), (2008) 216-21 <Link>
  • "The Critical Role of Side-Chain Attachment Density on the Order and Device Performance of Polythiophenes," R.J. Kline, D.M. DeLongchamp, D.A. Fischer, E.K. Lin, L.J. Richter, M.L. Chabinyc, M.F. Toney, M. Heeney, and I. McCulloch, Macromolecules 40 (22), (2007) 7960-5 <Link>
  • "Significant dependence of morphology and charge carrier mobility on substrate surface chemistry in high performance polythiophene semiconductor films," R.J. Kline, D.M. DeLongchamp, D.A. Fischer, E.K. Lin, M. Heeney, I. McCulloch, M.F. Toney, Appl. Phys. Lett., 90 (6), (2007) 062117 <Link>
  • "Liquid-Crystalline Semiconductoring Polymers with High-Charge Carrier Mobility," I. McCulloch, M. Heeney, C. Bailey, K. Genevicius, I. MacDonald, M. Shkunov, D. Sparrowe, S. Tierney, R. Wagner, W. Zhang, M.L. Chabinyc, R.J. Kline, M.D. McGehee, M.F. Toney, Nature Materials 5 (4), (2006) 328-333 <Link>
  • "Highly Oriented Crystals at the Buried Interface in Polythiophene Thin-Film Transistors," R.J. Kline, M.F. Toney, and M.D. McGehee, Nature Materials 5 (3), (2006) 222-228 <Link>
  • "Correlation between Field-Effect Mobility of Regioregular Polythiophene to Morphology and Molecular Weight," R.J. Kline, M.D. McGehee, E.N. Kadnikova, J Liu, J.M.J. Frechet, M.F. Toney, Macromolecules 38 (8), (2005), 3312-3319 <Link>
  • "Controlling the Field-Effect Mobility of Regioregular Polythiophene by Changing the Molecular Weight," R.J. Kline, M.D. McGehee, E.N. Kadnikova, J Liu, J.M.J. Frechet, Adv. Mater. 15 (18), (2003) 1519 <Link>

Publications

X-ray Metrology for the Semiconductor Industry Tutorial

Author(s)
Daniel F. Sunday, Wen-Li Wu, Scott Barton, Regis J. Kline
The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation

Metrology for the next generation of semiconductor devices

Author(s)
Ndubuisi G. Orji, Mustafa Badaroglu, Bryan M. Barnes, Carlos Beitia, Benjamin D. Bunday, Umberto Celano, Regis J. Kline, Mark Neisser, Yaw S. Obeng, Andras Vladar
The semiconductor industry continues to produce ever smaller devices that are ever more complex in shape and contain ever more types of materials. The ultimate
Created October 9, 2019, Updated November 14, 2019