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Physics

Optical physics and communications

News and Updates

Projects and Programs

Spectroscopic ellipsometry measurement of a 2D monolayer and the optical property for such a thin layer.

Optical and Optoelectronic Materials Characterization

Ongoing
Today's electronics have reached a point where sheer computation power has combined form and function as the key driver of large consumer markets. The demand for portable and pervasive electronics with greater functionality promises significant changes over the next decades in how society interacts
ROSI

Building the next generation reference reflectometer

Ongoing
Have you ever wondered why some objects appear glossy, and others diffuse? Or thought about the complexity of characterizing the way light reflects from an object under different illumination and viewing angles and at different wavelengths in order to realistically render it in a computer simulation

Optical scattering from surfaces

Ongoing
Light Scattering Ellipsometry: The polarization of scattered light can often indicate the source of that scattered light. Using Light Scattering Ellipsometry, whereby the polarization of light scattered into directions out of the plane of incidence is measured for a fixed incident polarization
nanowires

GaN Nanowire Metrology and Applications

Ongoing
GaN Nanowire LEDs: Our selective epitaxy methods and dopant characterization techniques have enabled fabrication of arrays of nanowire LEDs with controlled location and spatial layout. This development is complemented by modeling of the carrier flow and recombination. These LEDs were combined to

Publications

Foundry manufacturing of octave-spanning microcombs

Author(s)
Jizhao Zang, Haixin Liu, Travis Briles, Scott Papp
Soliton microcombs provide a chip-based, octave-spanning source for self-referencing and optical metrology. We use a silicon nitride integrated photonics

Software

HolograFREE

An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines

Modeled integrated scatter tool (MIST)

The MIST program has been developed to provide users with a general application to model an integrated scattering system. The program performs an integration of

Tools and Instruments

Beamline 7

Beamline 7: EUV reflectometry

The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then

Awards