Lowney, J.
, Postek, M.
and Vladar, A.
(1994),
A Monte Carlo Model for SEM Linewidth Metrology, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control VIII, San Jose, CA, USA
(Accessed October 21, 2025)
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A Monte Carlo Model for SEM Linewidth Metrology
Published
Author(s)
, ,
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control VIII
Volume
2196
Conference Location
San Jose, CA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1994, Updated October 12, 2021