Ultra-Precision Linear Motion Metrology

Published

June 23, 2010

Author(s)

Ronnie R. Fesperman Jr., M A. Donmez, Shawn P. Moylan

Abstract

Many new emerging applications of nanotechnologies require the use of compact precision linear translation stages that have positioning resolution on the order of a nanometer and an exceptionally long range of motion on the order of tens of millimeters. Such devices are expected to perform with sub-micrometer positioning accuracy and repeatability. Manufacturers and consumers of such systems have begun to recognize the difficulties in certifying the performance of these systems with appropriate levels of measurement uncertainty. Sources of measurement uncertainty that were once considered insignificant when measuring in the micrometer regime are now becoming very significant while measuring in the nanometer regime. This paper describes the work being performed to investigate and evaluate the use of interferometry for measuring and determining the accuracy and repeatability of positioning numerically controlled axes with levels of uncertainty of a few nanometers or better.

Proceedings Title

ASPE 2010 Summer Topical Meeting on Precision Interferometric Metrology

Volume

49

Conference Dates

June 23-25, 2010

Conference Location

Asheville, NC

Pub Type

Conferences

Download Paper

Local Download

Keywords

Displacement Measuring Interferometry, Uncertainty, Position Accuracy and Repeatability

Citation

Fesperman, R. , Donmez, M. and Moylan, S. (2010), Ultra-Precision Linear Motion Metrology, ASPE 2010 Summer Topical Meeting on Precision Interferometric Metrology, Asheville, NC, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905833 (Accessed October 14, 2025)