The Nanolithography Toolbox

Published

October 19, 2016

Author(s)

Krishna Coimbatore Balram, Daron Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Richard Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Kartik Srinivasan, Samuel Stavis, Vladimir Aksyuk, James Alexander Liddle, Slava Krylov, Robert Ilic

Abstract

This article describes a platform-independent software package for scripted lithography pattern layout generation and complex processing. The Nanolithography Toolbox, developed at the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST), was designed to help CNST NanoFab users create aggressively-scaled nanoscale device architectures. The Toolbox offers many parametrized shapes, including micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic device structure libraries. Using these shapes as building blocks, through scripting and programming, the Toolbox allows users to rapidly develop nanoscale pattern layouts of arbitrary complexity. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or to create vectorized shapes using Bezier curves. The Toolbox can be applied to a broad range of micro- and nano-device fabrication tasks.

Citation

Journal of Research (NIST JRES) -

Volume

121

NIST Pub Series

Journal of Research (NIST JRES)

Pub Type

NIST Pubs

Download Paper

https://doi.org/10.6028/jres.121.024

Local Download

Keywords

CAD, Lithography, Nanoscale design, Nanoscale curved features, Nanoscale devices, Nanophotonic, Nanoplasmonic, Nanofluidic

Citation

Coimbatore Balram, K. , Westly, D. , Davanco, M. , Grutter, K. , Li, Q. , Michels, T. , Ray, C. , Kasica, R. , Wallin, C. , Gilbert, I. , Bryce, B. , Simelgor, G. , Topolancik, J. , Lobontiu, N. , Liu, Y. , Neuzil, P. , Svatos, V. , Dill, K. , Bertrand, N. , Metzler, M. , Lopez, G. , Czaplewski, D. , Ocola, L. , Srinivasan, K. , Stavis, S. , Aksyuk, V. , Liddle, J. , Krylov, S. and Ilic, R. (2016), The Nanolithography Toolbox, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/jres.121.024, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=921714 (Accessed October 5, 2025)