The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS) method. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. The presentations were made at “X-ray Metrology for the Semiconductor Industry” short course at the National Institute of Standards and Technology on Aug 25, 2016.
|Dr. R. Joseph Kline||CDSAXS Overview|
|Dr. Wen-li Wu||Diffraction Theory|
|Dr. Scott Barton||CDSAXS Instrumentation I|
|Dr. R. Joseph Kline||CDSAXS Instrumentation II|
|Dr. Daniel Sunday||CDSAXS Data and Analysis|