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Projects/Programs

Displaying 401 - 425 of 1602

Digital Twins for Advanced Manufacturing

Ongoing
Objective To provide measurement science and open standards to help manufacturers better define, measure, analyze, and control advanced manufacturing systems using digital twins and enable a marketplace for digital twin users and technology providers. Technical Idea This Digital Twins for Advanced

Digital Video Exchange Standards

Ongoing
NIST is working to develop a data export standard in conjunction with the stakeholder community. The goal of standardization is to increase evidentiary value and timeliness of CCTV video data; and to facilitate interoperable data sharing between CCTV/DVR owners and Law Enforcement; as well as among

Dimensional Measurement Services

Ongoing
The Dimensional Measurement Services project promotes manufacturing innovation and U.S. industrial competitiveness by providing critical technology-enabling high accuracy dimensional measurements within an internationally accepted quality system. These measurements span the dimensional metrology

Dimensional Metrology for Nanoscale Patterns

Completed
Dimensional metrology and control is a critical component of semiconductor fabrication. State-of-the-art integrated circuits are comprised of nearly a billion nanoscale transistors linked together by an equally as impressive nanoscale network of conductors, insulators, and capacitors. To ensure that

Directed Self Assembly of Block Copolymers for Nanopatterning

Ongoing
One of the key issues for DSA is the three dimensional structure of the block copolymer. For the example of line-space patterns made using lamella-forming block copolymers, it is possible to have the DSA form tilted lamella or complex mixed morphologies that are a combination of vertical and

Directed Self-Assembly of Block Copolymers (Archived)

Completed
Diblock copolymers are long molecular chain polymers with two (di) regions, or blocks, of dissimilar monomers. They are constructed by covalently linking two different polymer chains at their ends. The two regions can be chosen so that they repel each other. Normally mixtures of different polymers

Directional Routing Protocols for Ad-hoc Networks

Completed
In wireless ad-hoc networks smart antenna techniques, capable of providing spatial reuse, longer ranges, interference suppression and other beneficial features, have been investigated to improve achievable performance and system capacity. Most works in current open literature focus on the design and

Disaster and Failure Studies & Disaster Metrology Studies

Completed
Objective - To provide leadership, coordination, and management for (1) the conduct of disaster and failure studies, including the development and maintenance of an archival data repository, (2) promoting the implementation of recommendations from disaster and failure studies, (3) carrying out the

I++ DME (Dimensional Measurement Equipment)

Completed
Industry Impact Adoption of I++ DME by a majority of vendors worldwide with compliant apps has been largely achieved due to Strong end user and CMM vendor support through groups such as I++ group, NIST, Dimensional Metrology Standards Consortium, International Association of CMM Manufacturers, and

DNA Mixture Interpretation

Ongoing
Interlaboratory Studies Mixture interlaboratory studies provide a means to assess a laboratory's ability to process and interpret DNA mixtures. Initial ‘Mixed Stain’ studies (published in 2001) provided physical samples for DNA profiling with the first commercial STR typing tests. Later, mixture

DNA Origami for Precise Manufacturing of Nanoscale Structures

Completed
The base pairing of adenine to thymine and guanine to cytosine to form DNA provides a robust molecular recognition scheme that can be used to create a wide variety of well-ordered nanostructures. DNA origami, which uses a long scaffold strand folded together by specific sets of short staple strands

DNA Technical Leader Survey

Ongoing
Please click here to start the survey The survey is now live and will close on June 17, 2022 (deadline has been extended). It is open to both U.S. and international agencies. It is to be completed by one person from each DNA laboratory – the Technical Leader (or equivalent). Frequently Asked

Documentary Standards: ANSI/IEEE N42.42 Standard

Completed
The ANSI/IEEE N42.42 standard specifies the XML data format that shall be used for both required and optional data to be made available by radiation measurement instruments. The performance requirements for these types of instruments are described in other standards. The output from these

Documentary Standards: IEC 62755 Standard N42 Data Format

Ongoing
The IEC 62755 standard specifies the XML data format that shall be used for both required and optional data to be made available by radiation measurement instruments. The performance requirements for these types of instruments are described in other IEC standards. The output from these instruments

Documentary Standards: Radiation Detection Documentary Standards Program

Ongoing
NIST leads and participates in the development and revision of documentary ANSI/IEEE (ANSI N42 standards currently transitioning to IEEE IMS TC 45 committee) and IEC (TC 45 WG B15 committee) standards that provide requirements and test methods for instruments used for the detection of illicit

Documentary Standards: X-ray Security Screening Applications

Ongoing
This work fills well-documented gaps in transportation security, which have been highlighted in Executive and Legislative requirements for 100 % screening of baggage, cargo, and airline passengers. This is accomplished through a corpus of new standards, test methods, test artifacts, dosimetry

Drug Analysis - Opioids and Emerging Threats

Ongoing
Package Interdiction Many synthetic opioids and novel psychoactive substances enter the country through international mail. Research in this area focuses on measurement challenges associated with detection and analysis of these packages at the point of seizure in international mail facilities

DUV/EUV Nanoscopy for Imaging Nanostructures

Ongoing
Novel optical nanoscopy techniques using deep-ultraviolet (DUV) and extreme-ultraviolet (EUV) laser sources are developed to characterize nanostructures with high dimensional sensitivity and low uncertainty for advancing the semiconductor devices manufacturing process. The illumination beam is

Dynamic EUV Imaging and Spectroscopy for Microelectronics

Ongoing
Collaborations with industry leaders have led us to develop new measurement techniques to improve our understanding thermal transport, spin transport, and nanoscopic (and interfacial) material properties in active device structures. Such capability requires the ability to measure these properties at

Dynamic EUV Metrology of Nanoscopic Thermal Transport in Active Devices

Ongoing
Heat is greatly impeding progress in microelectronics, which is only getting worse as dimensions are reduced and device architectures move more towards being 3-dimensional. The dynamics and physics of nanoscale thermal transport are unknown and dynamic measurements of active devices at this scale do

Dynamic Mechanical Metrology: Acceleration, Force, and Acoustics

Ongoing
The Dynamic Mechanical Metrology Project develops standards and provides calibrations for SI-traceable acceleration, acoustical and dynamic force metrology. We develop improved reference standards and calibration techniques, sensor-embedded standards, calibration techniques for new technologies, and

Dynamic Nanoflow Metrology

Ongoing
Ultra-precise and dynamic flow measurements are needed for high-throughput biological studies and for dynamic control of chemical delivery systems in medical and biotechnology applications. In addition, existing analytical methods, such as analytical high-performance liquid chromatography (HPLC) and

Dynamic Plasticity: Non-Equilibrium Mechanics

Ongoing
The optimization of high-speed machining processes through powerful finite element modeling techniques is an important pathway to American manufacturing competitiveness in an increasingly competitive global marketplace. Quantitatively accurate simulations of machining rely on robust constitutive

Dynamic Pressure

Ongoing
Measurement Platform: We are developing a photonics based dynamic pressure measurement platform that will enable traceable, accurate measurement of dynamic pressure. To this end we are developing fast scanning laser absorption spectroscopy techniques that enable rapid measurement of pressure
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