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For decades, astronomers and physicists have been trying to solve one of the deepest mysteries about the cosmos: An estimated 85% of its mass is missing.
The newest generation of lithium-ion batteries now under development promises a revolution in powering cell phones, electric vehicles, laptops and myriad other
Researchers at the National Institute of Standards and Technology (NIST) and collaborators have devised and tested a new, highly sensitive method of detecting
Since 1970, the National Institute of Standards and Technology (NIST) has awarded Precision Measurement Grants for significant research in the field of
In the vacuum ultraviolet and extreme ultraviolet (EUV), the indices of refraction of all materials become complex: N = n + ik, or N = 1- d + ik. Here, n is the
Tunnel junctions, single electron transistors and superconducting resonators are fabricated using ultra-high vacuum metals’ deposition and in situ low energy
The extreme ultraviolet detector (EUVD) calibration service disseminates the U.S. national scale of detector responsivity in the wavelength range from 5 nm to
Spencer Reisbick, Myung-Geun Han, Chuhang Liu, yubin zhao, Eric Montgomery, Vikrant Gokhale, Jason J. Gorman, Chunguang Jing, June W. Lau, Yimei Zhu
The development of ultrafast electron microscopy (UEM), specifically stroboscopic imaging, has brought the study of structural dynamics to a new level by
Jacob Taylor, Daniel Carney, Hartmut Haffner, David Moore
Electrons and ions trapped with electromagnetic fields have long served as important high- precision metrological instruments, and more recently have also been
An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines
The new beamline 10, currently under construction, is intended for applications that make use of the super-thermal brightness from SURF in the near- to mid
Beamline 5 of the Synchrotron Ultraviolet Radiation Facility is a diagnostics end-station used to determine the transverse size of the stored electron beam. The
The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then
Beamline 8 is used to study the degradation of surfaces that are irradiated by EUV radiation in the presence of common outgas species. Its multilayer mirror