semiconductor industry

NIST Study Aims to Improve Utility of the Scanning Electron Microscope

April 25, 2025

Using an electron beam to image the tiniest of defects and patterns on microchips, the scanning electron microscope (SEM) has long been a mainstay of the

No Fib: NIST Unmasks a Superfast Process for Nanoscale Machining

August 23, 2022

Cutting intricate patterns as small as several billionths of a meter deep and wide, the focused ion beam (FIB) is an essential tool for deconstructing and

NIST Researchers Resurrect and Improve a Technique for Detecting Transistor Defects

February 3, 2022

Researchers at the National Institute of Standards and Technology (NIST) have revived and improved a once-reliable technique to identify and count defects in

New Chip Defect-finding Scheme Attracts Industry Leaders

May 27, 2015

Until recently, the semiconductor industry had a go-to method for quantifying atomic-scale defects in the billions of transistors contained in a single computer

Metrology for Nanoimprint Lithography

Our goal is to develop, advance, and demonstrate measurements that facilitate Nanoimprint Lithography (NIL) as a viable technology for the patterning of robust

Characterization of 3D Photovoltaics

Our goal is to provide industry with test structures and models of next-generation photovoltaics, with an initial focus on cadmium telluride (CdTe) and CuIn xGa

Polymers for Next-Generation Lithography

Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art