semiconductor industry

No Fib: NIST Unmasks a Superfast Process for Nanoscale Machining

August 23, 2022

Cutting intricate patterns as small as several billionths of a meter deep and wide, the focused ion beam (FIB) is an essential tool for deconstructing and

NIST Researchers Resurrect and Improve a Technique for Detecting Transistor Defects

February 3, 2022

Researchers at the National Institute of Standards and Technology (NIST) have revived and improved a once-reliable technique to identify and count defects in

New Chip Defect-finding Scheme Attracts Industry Leaders

May 27, 2015

Until recently, the semiconductor industry had a go-to method for quantifying atomic-scale defects in the billions of transistors contained in a single computer

Metrology for Nanoimprint Lithography

Our goal is to develop, advance, and demonstrate measurements that facilitate Nanoimprint Lithography (NIL) as a viable technology for the patterning of robust

Characterization of 3D Photovoltaics

Our goal is to provide industry with test structures and models of next-generation photovoltaics, with an initial focus on cadmium telluride (CdTe) and CuIn xGa

Polymers for Next-Generation Lithography

Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art