X-ray Metrology for the Semiconductor Industry Tutorial

Published: February 01, 2019

Author(s)

Daniel F. Sunday, Wen-Li Wu, Scott Barton, Regis J. Kline

Abstract

The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation nanodevices. The purpose of this short course is to train the semiconductor industry on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS) method. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected audience include semiconductor manufacturers, equipment manufacturers, and component manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor Industry” short course at the National Institute of Standards and Technology on Aug. 25, 2016.
Citation: Journal of Research (NIST JRES) -
Volume: 124
Pub Type: NIST Pubs

Keywords

CDSAXS, dimensional metrology, semiconductor industry, small angle x-ray scattering
Created February 01, 2019, Updated February 01, 2019