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Virtual Metrology White Paper - INTERNATIONAL ROADMAP FOR DEVICES AND SYSTEMS(IRDS)

Published

Author(s)

Ndubuisi G. Orji, Yaw S. Obeng, Carlos Beitia, Supika Mashiro, James Moyne

Abstract

This white paper provides an overview of virtual metrology (VM) and the benefits it can provide, with cost reduction (both capital expenditure and cycle time) being the primary benefit. The white paper also examines some of the issues preventing wider adoption of VM, and offers some possible solutions. The key adoption issues identified in this white paper primarily came from a survey of advanced process control (APC) users, implementers, and managers, conducted by the International Roadmap for Devices and Systems (IRDS) Factory Integration focus team, to help understand the current state of VM adoption.
Citation
IEEE-INTERNATIONAL ROADMAP FOR DEVICES AND SYSTEMS (IRDS)

Keywords

VIRTUAL METROLOGY, REAL METROLOGY, YIELD, AUTOMATED PROCESS CONTROL, RUN TO RUN CONTROL (R2R), SMART SAMPLING

Citation

Orji, N. , Obeng, Y. , Beitia, C. , Mashiro, S. and Moyne, J. (2018), Virtual Metrology White Paper - INTERNATIONAL ROADMAP FOR DEVICES AND SYSTEMS(IRDS), IEEE-INTERNATIONAL ROADMAP FOR DEVICES AND SYSTEMS (IRDS), [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=924090 (Accessed June 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 9, 2018, Updated July 18, 2019