Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water

Published

April 23, 2014

Author(s)

Brent A. Sperling, John Hoang, William A. Kimes, James E. Maslar, Kristen L. Steffens, Nhan V. Nguyen

Abstract

Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. Decomposition of the adsorbed TDMAT is observed without any evidence of an adsorbed product. Ex situ measurements indicate that decomposition does not introduce impurities or dramatically increase the growth rate. A desorbing decomposition product is consistent with these observations. RAIRS also indicates that dehydroxylation of the growth surface occurs only among one type of surface hydroxyl groups. Molecular water is observed to participate in reactions even at a relatively high temperature and with long purge times.

Citation

Journal of Vacuum Science and Technology A

Volume

32

Issue

3

Pub Type

Journals

Download Paper

https://doi.org/10.1116/1.4872166

Keywords

Atomic layer deposition, Reflection-absorption infrared spectroscopy, Titanium dioxide, Tetrakis(dimethylamido)titanium

Citation

Sperling, B. , Hoang, J. , Kimes, W. , Maslar, J. , , K. and Nguyen, N. (2014), Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water, Journal of Vacuum Science and Technology A, [online], https://doi.org/10.1116/1.4872166 (Accessed April 26, 2024)