Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water
Brent A. Sperling, John Hoang, William A. Kimes, James E. Maslar, Kristen L. Steffens, Nhan V. Nguyen
Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. Decomposition of the adsorbed TDMAT is observed without any evidence of an adsorbed product. Ex situ measurements indicate that decomposition does not introduce impurities or dramatically increase the growth rate. A desorbing decomposition product is consistent with these observations. RAIRS also indicates that dehydroxylation of the growth surface occurs only among one type of surface hydroxyl groups. Molecular water is observed to participate in reactions even at a relatively high temperature and with long purge times.
, Hoang, J.
, Kimes, W.
, Maslar, J.
, , K.
and Nguyen, N.
Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water, Journal of Vacuum Science and Technology A, [online], https://doi.org/10.1116/1.4872166
(Accessed November 28, 2023)