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Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity

Published

Author(s)

Charles E. Bouldin, William E. Wallace, G W. Lynn, S C. Roth, Wen-Li Wu
Citation
Japanese Journal of Applied Physics
Volume
88(2)

Keywords

electronic materials, reflectivity, silicon, thin films, thin-films

Citation

Bouldin, C. , Wallace, W. , Lynn, G. , Roth, S. and Wu, W. (2000), Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity, Japanese Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853677 (Accessed April 16, 2024)
Created December 31, 1999, Updated October 12, 2021