Wang, Q.
(2010),
A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate, OSA Digest Series, Jackson Hole, WY, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905044
(Accessed December 4, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate
Published
Author(s)
Abstract
A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).Proceedings Title
OSA Digest Series
Conference Dates
June 13-16, 2010
Conference Location
Jackson Hole, WY
Conference Title
Optical Fabrication and Testing 2010
Pub Type
Conferences
Download Paper
Keywords
CGH, RIE, EDGE, EFFECT
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created June 13, 2010, Updated February 19, 2017