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A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate

Published

Author(s)

Quandou (. Wang

Abstract

A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).
Proceedings Title
OSA Digest Series
Conference Dates
June 13-16, 2010
Conference Location
Jackson Hole, WY
Conference Title
Optical Fabrication and Testing 2010

Keywords

CGH, RIE, EDGE, EFFECT

Citation

Wang, Q. (2010), A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate, OSA Digest Series, Jackson Hole, WY, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905044 (Accessed April 21, 2024)
Created June 13, 2010, Updated February 19, 2017