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Search Publications by: Marc J. Cangemi (Fed)

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Displaying 1 - 3 of 3

Rectangular Scale-Similar Etch Pits in Monocrystalline Diamond

September 15, 2011
Author(s)
Craig D. McGray, Richard A. Allen, Marc J. Cangemi, Jon C. Geist
Etching of monocrystalline diamond in oxygen and water vapor at 1100° C through small pores in a silicon nitride film produced smooth-walled rectangular cavities. The cavities were imaged by electron microscope and measured by interferometric microscopy

Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust

April 12, 2009
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Thomas B. Renegar, Xiaoyu A. Zheng, Theodore V. Vorburger, Albert M. Hilton, Marc J. Cangemi, Lei Chen, Michael A. Hernandez, Russell E. Hajdaj, Michael R. Bishop, Aaron Cordes
In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) – a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab – a 1765 m2 (19,000 ft2) clean

EUVL dosimetry at NIST

March 13, 2009
Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three extreme