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Search Publications by: William A. Kimes (Fed)

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Displaying 26 - 33 of 33

Comparing the Transient Response of a Resistive-Type Sensor With a Thin Film Thermocouple During the Post-Exposure Bake Process

April 1, 2004
Author(s)
Kenneth G. Kreider, D P. DeWitt, J B. Fowler, J E. Proctor, William A. Kimes, Dean C. Ripple, Benjamin K. Tsai
Recent studies on dynamic temperature profiling and lithographic performance modeling of the post-exposure bake (PEB) process have demonstrated that the rate of heating and cooling may have an important influence on resist lithographic response. Generally

Calibration of Radiation Thermometers in Rapid Thermal Processing Tools Using Si Wafers with Thin Film Thermocouples

October 1, 2003
Author(s)
Kenneth G. Kreider, William A. Kimes, Christopher W. Meyer, Dean C. Ripple, Benjamin K. Tsai, D H. Chen, D P. DeWitt
Rapid thermal processing (RTP) tools are currently monitored and controlled with lightpipe radiation thermometers (LPRTs) which have been calibrated with thermocouple instrumented wafers. We have developed a thin-film thermocouple wafer that enables more

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
curate temperature measurements are critical in rapid thermal processing (RTP) of silicon wafers for thermal oxidation and dopant anneals. Many RTP tools use lightpipe radiation thermometers (LPRTs) to measure the wafer temperatures during processing

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
Lightpipe radiation thermometers (LPRTs) are the preferred temperature monitoring sensor in most rapid thermal processing (RTP) tools for semiconductor fabrication. These tools are used for dopant anneal, gate oxide formation, and other high temperature

Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement

September 1, 2002
Author(s)
D H. Chen, D P. DeWitt, Benjamin K. Tsai, Kenneth G. Kreider, William A. Kimes
Lightpipe radiation thermometers (LPRTs) are widely used to measure wafer temperatures in rapid thermal processing (RTP) tools. Using blackbody-calibrated LPRTs to infer the wafer temperature, it is necessary to build a model to predict the effective