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PUBLICATIONS

Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed

Published

Author(s)

Benjamin K. Tsai, J Bodycomb, D P. DeWitt, Kenneth G. Kreider, William A. Kimes
Proceedings Title
IEEE International Conference on Advanced Thermal Processing of Semiconductors |12th | | IEEE
Conference Dates
September 28-30, 2004
Conference Title
IEEE International Conference on Advanced Thermal Processing of Semiconductors
Pub Type
Conferences

Keywords

calibration, emissivity, emissivity compensated pyrometry, pyrometry, rapid thermal processing, silicon wafer, specular surface

Citation

Tsai, B. , Bodycomb, J. , DeWitt, D. , Kreider, K. and Kimes, W. (2004), Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed, IEEE International Conference on Advanced Thermal Processing of Semiconductors |12th | | IEEE (Accessed April 23, 2024)

Created September 1, 2004, Updated February 17, 2017