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Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed

Published

Author(s)

Benjamin K. Tsai, J Bodycomb, D P. DeWitt, Kenneth G. Kreider, William A. Kimes
Proceedings Title
IEEE International Conference on Advanced Thermal Processing of Semiconductors |12th | | IEEE
Conference Dates
September 28-30, 2004
Conference Title
IEEE International Conference on Advanced Thermal Processing of Semiconductors

Keywords

calibration, emissivity, emissivity compensated pyrometry, pyrometry, rapid thermal processing, silicon wafer, specular surface

Citation

Tsai, B. , Bodycomb, J. , DeWitt, D. , Kreider, K. and Kimes, W. (2004), Emissivity Compensated Pyrometry for Specular Silicon Surfaces on the NIST RTP Test Bed, IEEE International Conference on Advanced Thermal Processing of Semiconductors |12th | | IEEE (Accessed July 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created September 1, 2004, Updated February 17, 2017