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Displaying 1551 - 1575 of 2189

High-Resolution Optical Overlay Metrology

May 1, 2004
Author(s)
Richard M. Silver, Ravikiran Attota, M R. Bishop, Jay S. Jun, Egon Marx, M P. Davidson, Robert D. Larrabee
Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements using

Improving the Uncertainty of Photomask Linewidth Measurements

May 1, 2004
Author(s)
J Pedulla, James E. Potzick, Richard M. Silver
The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these

Uncertainties in Small-Angle Measurement Systems Used to Calibrate Angle Artifacts

May 1, 2004
Author(s)
Jack A. Stone Jr., M Amer, Bryon S. Faust, Jay H. Zimmerman
We have studied a number of effects that can give rise to errors in small-angle measurement systems when they are used to calibrate artifacts such as optical polygons. Of these sources of uncertainty, the most difficult to quantify are errors associated

Photomask Critical Dimension Metrology in the Scanning Electron Microscope

April 7, 2004
Author(s)
Michael T. Postek
Critical Dimension (CD) control begins at the photomask. Therefore, photomask metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 100, 65 and 45 nanometer

UML 2 Activity and Action Models, Part 5: Partitions

April 1, 2004
Author(s)
Conrad E. Bock
This is the fifth in a series introducing the activity model in the Unified Modeling Language, version 2 (UML 2), and how it integrates with the action model. The first article gives an overview of activities and actions, while the next three cover actions

Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications

March 1, 2004
Author(s)
James D. Gilsinn, Hui Zhou, Bradley N. Damazo, Joseph Fu, Richard M. Silver
As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty

A Multiscale Fabrication Approach to Microfluidic System Development

January 1, 2004
Author(s)
Tony L. Schmitz, John A. Dagata, Brian S. Dutterer, W G. Sawyer
Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices links

Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer

January 1, 2004
Author(s)
Richard M. Silver, H Zou, S Gonda, Bradley N. Damazo, Jay S. Jun, Carsten P. Jensen, Lowell P. Howard
We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuously

Initial Measurement Results for 20 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Li Ma, Jun-Feng Song, Eric P. Whitenton, Theodore V. Vorburger, J Zhou, A Zheng
The SRM (Standard Reference Material) 2460 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol

Initial Measurement Results for 40 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Jun-Feng Song, Eric P. Whitenton, Li Ma, Theodore V. Vorburger, A Zheng
The RM (Reference Material) 8240 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol, Tobacco

Interim Report on Single Crystal Critical Dimension Reference Materials (SCCDRM)

January 1, 2004
Author(s)
Ronald G. Dixson, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Brandon Park, Christine E. Murabito, Joaquin (. Martinez
The single crystal critical dimension reference materials (SCCDRM) project has been completed, and the samples for the SEMATECH member companies have been released for distribution. The final technology transfer report is currently undergoing revision and
Displaying 1551 - 1575 of 2189
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