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Surface Oxidation of a Silicon Powder Studied by X-Ray Photoelectron Spectroscopy and X-Ray Induced Auger Electron Spectroscopy

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P S. Wang, T N. Wittberg

A commercial silicon powder was studied by x-ray photoelectron spectroscopy (XPS) and x-ray induced Auger electron spectroscopy (XAES). These techniques were used to determine the oxidation kinetics for this powder in the temperature range from 600 to 750

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