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Displaying 48451 - 48475 of 73697

Direct Measurement of Valence-Charge Asymmetry by X-Ray Standing Waves

January 1, 2000
Author(s)
Joseph C. Woicik, E Nelson, P Pianetta
By detecting valence-photoelectron under condition of strong x-ray Bragg reflection, we have determined that a majority of GaAs valence charge resides on the anion sites of this heteropolar crystal, in quantitative agreement with the Ga-As bond polarity as

Display Characteristics and the Impact on Usability for Stereo

January 1, 2000
Author(s)
John W. Roberts, Oliver T. Slattery
Over the past decade, the number of electronic display technologies available to consumers has risen dramatically, and the capabilities of existing technologies have expanded. This proliferation of choices provides new opportunities for visual stereo

Early Streamer Emission Lightning Protection Systems: An Overview

January 1, 2000
Author(s)
Richard J. Van Brunt, Thomas L. Nelson, Ken L. Stricklett
Early streamer emission (ESE) lightning protection systems are a relatively new approach to the perennial problem of lightining damage, and these systems may hold promise for a more effective protection against lighting. However, the scientific and

Effects of Annealing on UHMWPE Molecular Orientation

January 1, 2000
Author(s)
S Sambasvian, Daniel A. Fischer, M C. Shen, John A. Tesk, Stephen M. Hsu
Ultra-high molecular weight polyethylene (UHMWPE) is the dominant material used in artificial joints due to its outstanding wear resistance. At the same time, UHMWPE wear debris has been found to contribute to the loosening of the im-plants. As life

Electron Interactions with CF 3 I

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Low-energy electron collision data for the plasma processing gas CF 3I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes. These

Electron Interactions With SF 6

January 1, 2000
Author(s)
Loucas G. Christophorou, James K. Olthoff
Sulfur hexafluoride (SF 6) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF 6 is comprehensively reviewed and critically
Displaying 48451 - 48475 of 73697
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