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Displaying 39251 - 39275 of 74151

IPPS: An Integrated Process Planning System

May 4, 2004
Author(s)
Suber Huang, J Mei, Xuhang Tong, Steven R. Ray
The past two decades have witnessed the development of many CAPP (Computer-Aided Process Planning) systems. From variant process planning to generative process planning, great progress has been made. However, due to the complexity of the problems involved

Cryogenics on a Chip

May 3, 2004
Author(s)
Jukka Pekola, Rob Schoelkopf, Joel Ullom
Low-temperature techniques often bring to mind cryogenic liquids, gas compressors, and massive installations. But researchers are now building refrigerators and sensors that work by controlling electrons on a silicon chip.

A chromium surface magneto-optical trap for magnetic microtrap studies

May 1, 2004
Author(s)
M Pichler, S Hill, Jabez J. McClelland
A surface magneto-optical trap for chromium atoms is demonstrated as a first step toward loading atoms into microscopic magnetic traps. Characteristics of the trap and transfer to microscopic magnetic traps will be discussed.

An Operator-Independent Approach to Mass Spectral Peak Identification and Integration

May 1, 2004
Author(s)
William E. Wallace, Anthony J. Kearsley, Charles M. Guttman
A mathematical algorithm is presented that accurately locates and calculates the area beneath mass spectral peaks using only reproducible mathematical operations and a NO user-selected sensitivity parameters. This represents a major refinement of last year

Data Standards for Proteomics: Mitochondrial Two-Dimensional Polyacrylamide Gel Electrophoresis Data as a Model System

May 1, 2004
Author(s)
Veerasamy Ravichandran, G B. Vasquez, S Srivastava, M Verma, E Petricoin, Joshua Lubell, Ram D. Sriram, Peter E. Barker, G L. Gilliland
The advent of human proteomics as a major discipline has led to a reexamination of the need for consensus and a nationally sanctioned set of proteomics technology standards. Such standards for databases and data reporting may be applied to Two-Dimensional

Design and Characterization of a Photometer--Colorimeter Standard

May 1, 2004
Author(s)
George P. Eppeldauer, M Racz
A photometer/tristimulus colorimeter has been developed at the National Institute of Standards and Technology (NIST) to realize a color scale. A novel construction was developed to implement the spectral responsivity based scale with small uncertainty. The

Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness

May 1, 2004
Author(s)
B Bunday, M R. Bishop, D Mccormack, John S. Villarrubia, Andras Vladar, Theodore V. Vorburger, Ndubuisi George Orji, J Allgair
The measurement of line-edge roughness (LER) has recently become a topic of concern in the litho-metrology community and the semiconductor industry as a whole. The Advanced Metrology Advisory Group (AMAG), a council composed of the chief metrologists from

Dimensional Metrology of Resist Lines Using a SEM Model-Based Library Approach

May 1, 2004
Author(s)
John S. Villarrubia, Andras Vladar, B Bunday, M R. Bishop
The widths of 284 lines in a 193 nm resist were measured by two methods and the results compared. One method was scanning electron microscopy (SEM) of cross-sections. The other was a model-based library (MBL) approach in which top-down CD-SEM line scans of
Displaying 39251 - 39275 of 74151
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