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NIST Authors in Bold

Displaying 35651 - 35675 of 73697

Mechanical Stability of Collagen Fibril Networks

November 1, 2005
Author(s)
Gordon A. Shaw, Dennis P. McDaniel, John T. Elliott, Alessandro Tona, Anne L. Plant
Thin films of type 1 collagen fibril networks fabricated on alkanethiol-functionalized surfaces have been previously shown to provide an excellent protein matrix for cultured cells in applications such as drug toxicity studies and studies of cell signaling

Methylmercury in Tuna: Demonstrating Measurement Capabilities and Evaluating Comparability of Results Worldwide from the CCQM P-39 Comparison

November 1, 2005
Author(s)
Michele M. Schantz, C Quetel, J P. Snell, Y Aregbe, L Abranko, Z S. Jokai, C Brunori, R Morabito, W Hagan, S. Azemard, E Wyse, V Fajon, M. Horvat, M. Logar, O.F. X. Donard, E Krupp, J Entwisle, R. Hern, K Inagaki, A Takatsu, P Grinberg, S. N. Willie, H Hintelmann, E Bjorn, E Blanco Gonzalez, G Centineo, J Ignacio Garcia Alonso, A Sanz-Medel

NIST Supply Chain Integration Solutions

November 1, 2005
Author(s)
Sharon J. Kemmerer
The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, we can: *Work with industry to

NIST/Library of Congress (LoC) Optical Media Longevity Study

November 1, 2005
Author(s)
Oliver T. Slattery, Jian Zheng
The Information Access Division (IAD) of the Information Technology Laboratory (ITL) at the National Institute of Standards and Technology (NIST) and the Preservation Directorate at the Library of Congress (LoC) agreed to instigate a detailed investigation

Ontology Formalization of Product Semantics for Product Lifecycle Management

November 1, 2005
Author(s)
Lalit Patil, Ram D. Sriram
Product Lifecycle Management (PLM) is a concept that takes into account that the development of a product is influenced by knowledge from various stakeholders throughout its lifecycle. Computing environments in the PLM framework are expected to have

Optics for Extreme Ultraviolet Lithography

November 1, 2005
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a major

Optimized Transition-Edge X-ray Microcalorimeter with 2.4 eV Energy Resolution at 5.9 keV

November 1, 2005
Author(s)
Joel Ullom, James A. Beall, W.Bertrand (Randy) Doriese, William Duncan, S. L. Ferreira, Gene C. Hilton, Kent D. Irwin, Carl D. Reintsema, Leila R. Vale
We present measurements from a series of transition- edge x-ray microcalorimeters designed for optimal energy resolution. We used the geometry of the sensors to control their heat capacity and employed additional normal metal features and a perpendicular
Displaying 35651 - 35675 of 73697
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