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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects:

Published

Author(s)

A Emre Yarimbiyik, Harry A Schafft, Richard A Allen, Mona E Zaghloul Zaghloul, David L Blackburn
Citation
- NIST IR 7234
Report Number
NIST IR 7234

Citation

Yarimbiyik, A. , Schafft, H. , Allen, R. , Zaghloul, M. and Blackburn, D. (2006), Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.7234 (Accessed May 26, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2006, Updated May 20, 2023