TY  - GEN
AU  - Yarimbiyik, A Emre
AU  - Schafft, Harry A
AU  - Allen, Richard A
AU  - Zaghloul, Mona E Zaghloul
AU  - Blackburn, David L
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 2006-01-01 05:01:00
DO  - https://doi.org/10.6028/NIST.IR.7234
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 2006
TI  - Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects:
ER  -