@misc{1139796,
  author = {A Emre Yarimbiyik and Harry A Schafft and Richard A Allen and Mona E Zaghloul Zaghloul and David L Blackburn},
  title = {Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects:},
  year = {2006},
  month = {2006-01-01 05:01:00},
  publisher = {, National Institute of Standards and Technology, Gaithersburg, MD},
  doi = {https://doi.org/10.6028/NIST.IR.7234},
  language = {en},
}