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Search Publications

NIST Authors in Bold

Displaying 33601 - 33625 of 73697

Microwave Resonances in Nanogranular (Fe

October 2, 2006
Author(s)
Massimo Pasquale, Sergio Perero, Giorgio Bertotti, Pavel Kabos
We have analyzed the microwave behavior of soft nanogranular (Fe 0.7uCo 0.3u) 71uB 22uNi films with thickness of 136, 195 and 236 nm which present a dc relative permeability from 60 to 280, a resistivity of 8 to 9×10 7d Ω}m and a zero-field double

Overview of the TREC 2005 Question Answering Track

October 2, 2006
Author(s)
Ellen M. Voorhees, Hoa T. Dang
The TREC 2005 Question Answering (QA) track contained three tasks: the main question answering task, the document ranking task, and the relationship task. In the main task, question series were used to define a set of targets. Each series was about a

A Brighter Future From Gallium Nitride Nanowires

October 1, 2006
Author(s)
Kristine A. Bertness, Norman Sanford, Albert Davydov
How might nitride semiconductor nanowires change the future of computing? In the spirit of this special issue on how science fiction might become working technology, we offer some speculations and explain the science behind them. This article focuses on

A Model-Driven Approach for Building OWL DL and OWL Full Ontologies

October 1, 2006
Author(s)
S Brockmans, R Colomb, P Haase, E Kendall, Evan K. Wallace, G Xie
This paper presents an approach for visually modeling OWL DL and OWL Full ontologies based on the well-established visual modeling language UML. We discuss a metamodel for OWL based on the Meta-Object Facility, an associated UML profile as visual syntax

A New Critical Dimension Metrology for Chrome-on-Glass Substrates Based ons-Parameter Measurements Extracted from Coplanar Waveguide Test Structures

October 1, 2006
Author(s)
Chidubem Nwokoye, Mona E. Zaghloul, Michael W. Cresswell, Richard A. Allen, Christine E. Murabito
In mask fabrication, Critical Dimension (CD) metrology is conducted by optical transmission, Scanning Electron Microscopy (SEM), and Atomic Force Microscopy (AFM) tools. All these have different advantages and limitations. The work reported here is the

Advanced Metrology Needs for Nanoelectronics Lithography

October 1, 2006
Author(s)
Stephen Knight, Ronald Dixon, Ronald L. Jones, Eric Lin, Ndubuisi G. Orji, Richard M. Silver, Andras Vladar, Wen-li Wu
The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features

An Optimized Electrophoresis System for Tandem SSCP and Heteroduplex Analysis of p53 Gene Exons 5-9 on Glass Microfluidic Chips

October 1, 2006
Author(s)
Christa N. Hestekin, J P. Jakupciak, Thomas N. Chiesl, C D. O'Connell, Annelise E. Barron, C W. Kan
With the sequencing of the human genome, there is a growing need for rapid and sensitive genotyping methods that can be incorporated into the clinical setting. DNA-based methods, such as single strand conformational polymorphism (SSCP) and heteroduplex

Anisotropy of Magnetization Reversal and Magnetoresistance in Square Arrays of Permalloy Nano-Rings

October 1, 2006
Author(s)
A Goncharov, A Zhukov, V Metlushko, G Bordignon, H Fangohr, C de Groot, John Unguris, Willard C. Uhlig, G Karapetrov, B Ilic, P A. de Groot
Magnetization reversal mechanisms and the impact of magnetization direction are studied in square arrays of interconnected circular permalloy nanorings using magnetooptical Kerr effect, local imaging, numerical simulations, and transport techniques

Eliminating FFT Artifacts in Vector Signal Analyzer Spectra

October 1, 2006
Author(s)
Michael McKinley, Kate Remley, M. Myslinski, J. S. Kenney
We present a method to minimize spectral leakage in measurements of periodic signals made with the vector signal analyzer (VSA) by taking into account the periodic nature of the Fast Fourier Transform (FFT). This method negates the need for filtering the

Evaluation Specimens for Izod Impact Machines (SRM 2115): Report of Analysis

October 1, 2006
Author(s)
Thomas A. Siewert, Jolene Splett, Raymond Santoyo
In the past few years, we have received a number of requests for verification specimens for Izod impact machines, similar to what we offer for Charpy impact machines. Although there are similarities between Izod and Charpy impact testing, there are some
Displaying 33601 - 33625 of 73697
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