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NIST Authors in Bold

Displaying 2301 - 2325 of 4212

Nano- and Atomic-Scale Length Metrology

January 1, 2006
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu
… quantities require accurate metrology to determine whether manufacturing specifications are being met. Calibrated step …

Interferometric Thickness Calibration of 300mm Silicon Wafers

July 20, 2005
Author(s)
Quandou (. Wang, Ulf Griesmann, Robert S. Polvani
The Improved Infrared Interferometer (IR3) at the National Institute of Standards and Technology (NIST) is a phase-measuring interferometer, operating at a wavelength of 1550 nm, which is being developed for measuring the thickness and thickness variation

NIST Random Profile Roughness Specimens and Standard Bullets

January 1, 2000
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Robert A. Clary, Michael L. McGlauflin, Eric P. Whitenton, Christopher J. Evans
… (NC) diamond turning process used previously for manufacturing random profile roughness specimens, two … same bullet signature anytime. In this paper, the design, manufacturing technique, testing results, and potential use …

NIST Random Profile Roughness Specimens and Standard Bullets

January 1, 2000
Author(s)
Jun-Feng Song, Theodore V. Vorburger, Christopher J. Evans, Michael L. McGlauflin, Eric P. Whitenton, Robert A. Clary
… (NC) diamond turning process used previously for manufacturing random profile roughness specimens, two … same bullet signature anytime. In this paper, the design, manufacturing technique, testing results, and potential use …

A Welding Cell That Supports Remote Collaboration

September 30, 1999
Author(s)
James D. Gilsinn, William G. Rippey, Joseph A. Falco, Timothy P. Quinn, Robert Russell, Keith A. Stouffer
… the NIST testbed technology and infrastructure for remote manufacturing that has been applied and demonstrated on a …

Information Modeling: From Design to Implementation

September 1, 1999
Author(s)
Yung-Tsun T. Lee
… Today's manufacturing industry greatly relies on computer technology … of quality information models to facilitate an integrated manufacturing environment. How information models are used to …

CAD-Directed Inspection

January 1, 1984
Author(s)
Ted Hopp
… We all know that the manufacturing process has a major impact on product cost, … a responsibility to provide an informed oversight to the manufacturing processes used in the production of its …

2024 ECTC Special Session Report: Advancing Metrology for Next-Generation Microelectronics

July 31, 2024
Author(s)
Ran Tao, Benson Chan, Jan Vardaman
… Metrology plays a pivotal role in semiconductor research, manufacturing, packaging and assembly. It is critical to the … material characterization, instrumentation, testing, and manufacturing capabilities are critically needed to drive product innovation and ensure quality, yield, and manufacturing efficiency. As we look into the future of …

Nanomanufacturing Metrology for Cellulosic Nanomaterials: an Update

December 1, 2014
Author(s)
Michael T. Postek
… The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, … have less embodied energy; utilize no catalysts in the manufacturing, are biologically compatible and, come from a …

The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology

February 6, 2008
Author(s)
Michael T. Postek, Andras Vladar
… Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a … (SEM) currently in use in semiconductor research and manufacturing facilities across the world. Due to the very …

National Institute of Standards and Technology - Texas Instruments Industrial Collaboratory Testbed

October 1, 1998
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec, Thomas E. Wheatley, Samuel N. Jones
… A portion of the mission of the NIST Manufacturing Engineering Laboratory (MEL) is to improve and … Instruments under the auspices of the National Automated Manufacturing Testbed (NAMT) and in collaboration with the … of telepresence microscopy within a large distributed manufacturing facility such as Texas Instruments and between …

Image Sharpness Measurement in Scanning Electron Microscopy - Part I

January 1, 1998
Author(s)
Michael T. Postek, Andras Vladar
… Scanning electron microscopes are routinely used in many manufacturing environments. Fully automated or semiautomated … are used in semiconductor production and other forms of manufacturing where the ability to measure small features …

Lumped-Element Impedance Standards

June 1, 1998
Author(s)
Dylan F. Williams, Dave K. Walker
We measure the electrical parameters of commercial lumped-element impedance standards manufactured for the calibration of on-wafer probing systems. The standard's impedance depends not only on the standard itself, but also on probe placement, probe

RF and A/MS Technologies

January 10, 2013
Author(s)
Herbert S. Bennett, John J. Pekarik
Radio frequency (RF), high-frequency (HF) and analog/mixed-signal (A/MS) technologies serve the rapidly growing communications and More than Moore (MtM) markets and represent essential and critical technologies for the success of many semiconductor
Displaying 2301 - 2325 of 4212
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