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NIST Authors in Bold

Displaying 29126 - 29150 of 74203

Adhesion Research at the National Institute of Standard and Technology (NIST)

March 11, 2009
Author(s)
Donald L. Hunston, Christopher M. Stafford
Over the years, NIST has been very active in adhesion research. Although there has never been an organizational group or large-scale program that focused specifically on this topic, a wide variety of projects have had adhesion, or related properties, as a

Effect of Strain on the Modulus of Sealants Exposed to the Outdoors

March 11, 2009
Author(s)
Christopher C. White, Donald L. Hunston, Kar T. Tan
The effects of applied strain on sealants exposed to outdoor weathering were examined for two sealant formulations, sealants A and C. Both static and dynamic strain was applied to the sealants during the summer in a Gaithersburg, MD-outdoor location. Both

Cell volume distributions reveal cell growth rates and division times

March 7, 2009
Author(s)
Michael W. Halter, John T. Elliott, Joseph B. Hubbard, Alessandro Tona, Anne L. Plant
A population of cells in culture displays a range of phenotypic responses, even when those cells are derived from a single cell and are exposed to a homogeneous environment. Phenotypic variability can have a number of sources, including the variable rates

Generating correlated (2+1)-photon pairs in an active-Raman-gain medium

March 5, 2009
Author(s)
Lu Deng, Cuiping Lu, Weiping Zhang, Chunhua Yuan
A scheme of generating controllable 2+1 photons in a double- atomic system based on active Raman gain is presented in this paper. Such 2+1 photons can be a potential candidate to generate a correlated photon pair as one photon of “2” photons acts as a

Phase transitions, entanglement and quantum noise interferometry in cold atoms

March 5, 2009
Author(s)
F. Mintert, A.M. Rey, Indubala I. Satija, Charles W. Clark
We show that entanglement monotones can characterize the pronounced enhancement of entanglement at a quantum phase transition if they are sensitive to long-range high order correlations. These monotones are found to develop a sharp peak at the critical

Thin-Film Resistance Thermometers on Silicon Wafers

March 3, 2009
Author(s)
Kenneth G. Kreider, Dean C. Ripple, William A. Kimes
Thermal processing of semiconductors is a critical, capital intensive step in achieving high yields and profitability in the manufacturing of electronic chips such as ASICs and DRAMs. Many techniques have been developed to control the temperature of the
Displaying 29126 - 29150 of 74203
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