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Published Date
Displaying 1551 - 1575 of 1934

Dose Calibration of Ion Implanters for Semiconductor Production

February 1, 1998
Author(s)
F A. Stevie, David S. Simons, J M. McKinley, J McMacken, R Santiesteban, P Flatch, J Becerro
Absolute dose calibration is important for process simulation and transfer of manufacturing to different production line or locations, but until recently, no viable standards were available. With the creation of a NIST standard for boron, it is now
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