Patrick, H.
, Germer, T.
, Ding, Y.
, , H.
, Richter, L.
and Soles, C.
(2008),
Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=900878
(Accessed October 14, 2025)
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Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Published
Author(s)
, , Yifu Ding, , ,
Abstract
We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal using a spectroscopic ellipsometer and analyzed using a rigorous-coupled-wave model. We show excellent agreement of scatterometry results with ex situ measurements of line height by atomic force microscopy and specular x-ray reflectivity. The in situ scatterometry results reveal differences in the shape evolution of the grating lines indiscernible by other methods.Citation
Applied Physics Letters
Volume
93
Pub Type
Journals
Download Paper
Keywords
ellipsometry, nanoimprint, optics, polymers, scatterometry, semiconductors
Citation
Issues
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Created December 9, 2008, Updated February 19, 2017