In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.
Proceedings Title: SPIE Proceedings Vol. 7488
Conference Dates: September 14-17, 2009
Conference Location: Monterey, CA
Conference Title: SPIE/BACUS Photomask Technology Conference 2009
Pub Type: Conferences
linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA, photomask