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Response to "Comment on 'The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor' "

Published

Author(s)

Mark Sobolewski

Abstract

The rf-bias-induced decreases in plasma electron density observed by us [J. Appl. Phys. 102, 113302 (2007)] and others [Fox-Lyon et al., J. Vac. Sci. Technol. A 32, 030601 (2014)] are better explained by changes in gas composition, rather than neutral gas depletion.
Citation
Journal of Applied Physics
Volume
132

Keywords

plasma, inductively coupled, radio-frequency, electron density

Citation

Sobolewski, M. (2022), Response to "Comment on 'The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor' ", Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=935158 (Accessed June 16, 2024)

Issues

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Created October 20, 2022, Updated March 15, 2023