Postek, M.
, Vladar, A.
, Keery, W.
, Bishop, M.
, Bunday, B.
and Allgair, J.
(2010),
Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology, Proceedings of SPIE Advanced Lithography, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905034
(Accessed March 13, 2025)
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Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published
Author(s)
, , , Michael R. Bishop, Benjamin Bunday, John Allgair
Abstract
A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification to more than 300 000 times magnification i.e. from about 10 mm to smaller than 300 nm range instrument field of view (FOV). This standard is identifi ed as RM 8820. This is a very versatile standard and it can also be used for calibration and testing of other type of microscopes, such as optical and scanning probe microscopes. Beyond scale calibration, RM 8820 can be used for a number of other applications some of which will be described in this publication.Proceedings Title
Proceedings of SPIE Advanced Lithography
Volume
7638
Conference Dates
February 22-24, 2010
Conference Location
San Jose, CA
Pub Type
Conferences
Download Paper
Keywords
standards, scanning electron microscope, traceability, magnification, field of view, scale, calibration
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created July 19, 2010, Updated February 19, 2017