TY  - CONF
AU  - Michael Postek
AU  - Andras Vladar
AU  - William Keery
AU  - Michael Bishop
AU  - Benjamin Bunday
AU  - John Allgair
C2  - Proceedings of SPIE Advanced Lithography, San Jose, CA
DA  - 2010-07-19
LA  - en
M1  - 7638
PB  - Proceedings of SPIE Advanced Lithography, San Jose, CA
PY  - 2010
TI  - Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905034
ER  -