@conference{32106,
  author = {Michael Postek and Andras Vladar and William Keery and Michael Bishop and Benjamin Bunday and John Allgair},
  title = {Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology},
  year = {2010},
  number = {7638},
  month = {2010-07-19},
  publisher = {Proceedings of SPIE Advanced Lithography, San Jose, CA},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905034},
  language = {en},
}