Russell, T.
and Maxwell, D.
(1979),
A production-compatible microelectronic test pattern for evaluating photomask misalignment:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.SP.400-51
(Accessed July 26, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
A production-compatible microelectronic test pattern for evaluating photomask misalignment:
Published
Author(s)
,
Citation
- NBS SP 400-51
Report Number
NBS SP 400-51
Pub Type
NIST Pubs
Download Paper
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1979, Updated May 19, 2023