Russell, T.
and Maxwell, D.
(1979),
A production-compatible microelectronic test pattern for evaluating photomask misalignment:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.SP.400-51
(Accessed October 14, 2024)
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A production-compatible microelectronic test pattern for evaluating photomask misalignment:
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- NBS SP 400-51
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NBS SP 400-51
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NIST Pubs
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Created January 1, 1979, Updated May 19, 2023