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A production-compatible microelectronic test pattern for evaluating photomask misalignment:

Published

Author(s)

T J Russell, D A Maxwell
Citation
- NBS SP 400-51
Report Number
NBS SP 400-51

Citation

Russell, T. and Maxwell, D. (1979), A production-compatible microelectronic test pattern for evaluating photomask misalignment:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.SP.400-51 (Accessed November 29, 2023)
Created January 1, 1979, Updated May 19, 2023