TY  - GEN
AU  - Russell, T J
AU  - Maxwell, D A
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1979-01-01 05:01:00
DO  - https://doi.org/10.6028/NBS.SP.400-51
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1979
TI  - A production-compatible microelectronic test pattern for evaluating photomask misalignment:
ER  -